工艺参数对SIAD法制备铜纳米线-铜膜复合结构的影响.rar

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摘  要:采用新发展的SIAD技术在玻璃衬底上成功制备了三组不同的铜纳米线/铜膜复合结构,第一组只改变沉积时间,第二组只改变衬底温度,第三组只改变衬底偏压,研究沉积时间、衬底温度、衬底偏压等工艺参数对复合结构晶体结构及光学性能的影响。研究结果表明:(1)在其它条件相同的前提下,随着沉积时间的增加,复合结构特别是Cu(111)晶向的衍射峰强度增加,SPR吸收峰强度减弱,峰位蓝移,半高宽先变窄后变宽;(2)在其它条件相同的前提下,随着衬底温度的增加,复合结构特别是Cu(111)晶向的衍射峰强度增加,SPR吸收峰强度增强,峰位蓝移,半高宽变窄;(3)在其它条件相同的前提下,随着衬底偏压的增加,复合结构特别是Cu(111)晶向的衍射峰强度减弱,SPR吸收峰强度减弱,峰位红移,半高宽变窄。

关键词:铜纳米线/铜膜复合结构;小入射角沉积(SIAD);晶体结构;表面等离子体共振(SPR)

 

Abstract:Via changing process parameters such as deposition time, substrate temperature and substrate bias voltage, three groups of copper nanowires/film composite structures were deposited on glass substrate by our newly developed small incident angle deposition (SIAD) technique. The influence of the process parameters on the crystal texture and optical property of as-deposited composite structures was investigated using X-ray diffractometer (XRD) and UV/VIS spectrometer. The detailed work and outstanding contributions are concentrated as in the following:

   (1) With the increase of deposition time, the intensity of Cu(111) texture enhanced, SPR absorption intensity decreased, SPR absorption peak was blue shifted and the full width at half-maximum (FWHM) of SPR absorption narrowed first and then broadened.

   (2) With the increase of substrate temperature, the intensity of Cu(111) texture enhanced, SPR absorption intensity enhanced, SPR absorption peak was blue shifted and the FWHM of SPR absorption narrowed.

   (3) With the increase of substrate bias voltage, the intensity of Cu(111) texture decreased, SPR absorption intensity decreased, SPR absorption peak was red shifted and the FWHM of SPR absorption narrowed.

Key words:copper nanowires/film composite structure; small incident angle deposition (SIAD); texture; surface plasmon resonance (SPR).

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